Characterization of Mo–V–N Coatings Deposited on XC100 Substrate by Sputtering Cathodic Magnetron
| dc.contributor.author | Brahim Chermime*,**, Abdelaziz Abboudi*, Hamid Djebaili**, and Mourad Brioua* | |
| dc.date.accessioned | 2024-02-13T16:24:05Z | |
| dc.date.available | 2024-02-13T16:24:05Z | |
| dc.date.issued | 2017-04-10 | |
| dc.description.abstract | The aim of this work is the characterization of ternary molybdenum–vana-dium nitride (Mo–V–N) coatings deposited on silicon and XC100 steel sub-strates by the reactive radiofrequency dual magnetron sputtering with dif-ferent contents of the Mo and V targets and nitrogen as reactive gas. The metal-target bias voltages are varied from 300 to 900 V. The hardness, sur-face morphology, microstructure and composition are studied by nanoinden-tation, scanning electron microscopy, atomic-force microscopy, and x-ray diffractometry. The Mo–V–N films manifest pyramidal surface morphology, high roughness (of 13.5 nm), but low mechanical properties. Hardness and Young’s modulus are found in the ranges of 10–18 GPa and 100–335 GPa, respectively. The residual stresses of coatings are compressive and varied be-tween 0.8 GPa and 2.5 GPa (calculated with the Stoney formula). | |
| dc.identifier.uri | http://dspace.univ-khenchela.dz:4000/handle/123456789/720 | |
| dc.title | Characterization of Mo–V–N Coatings Deposited on XC100 Substrate by Sputtering Cathodic Magnetron |