ZnO Films Elaborated by D.C. Magnetron Sputtering

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The effect of the oxygen flow rate on the structural and optical properties of ZnO films was investigated. Zinc oxide films were deposited Si (100) wafers and glass substrate by a DC magnetron sputtering technique using Zn targets in an Ar/O2 mixture atmosphere. The oxygen content was changed from 10 to 30 sccm. The different properties were analyzed by using XRD, SEM, profilometer, and UVvisible. The evolution of optical and structural proprieties as O2 was investigated by XRD, Profilometer, FESEM and UV-visible. O2 increasing lead to improve ZnO crystallinity in wirtzite phase and the films present (002) preferential orientation along the c-axis. ZnO films present a significant improvement in band gap that present an enlargement from 3.13 to 3.30 eV due to the crystallite size increase from 22 to 30 nm.