Tribological Study of Molybdenum Nitrides Under the Effect of Vanadium
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Date
2018-10-29
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Abstract
Our study of the MoVN ternary thin films has the objective of improving certain tribological and
mechanical characteristics and of finding the appropriate stoichiometry to have the microstructure that
corresponds to the desired properties using the characterization techniques: SEM -XRD-EDS-XPS- WDS.
Nano-indentation and the scrash-test. Note that wear and friction resistance does not depend on the
internal characteristics of the materials in contact as is usually the case for mechanical properties, but
rather depends mainly on the structure and morphology and experimental conditions. Hypotheses will be
presented in order to explain the tribological behavior of deposits and to match them to their
physicochemical and mechanical properties. The EDS-XPS microanalyses revealed that the atomic ratio
(N/V) ~ 1 for VN, that (N/Mo) 1.22 for MoN and that (N/(Mo + V)) 1 for the MoVN ternary films.
From this figure we find that the MoN film has an average coefficient of friction of 0.65. This film then
has good wear resistance. Comparing this value with that obtained on MoN coatings deposited by the
Alcatel PVD sputtering system on AISI substrate, (which is of the order of 0.45) therefore better than that
deposited on XC100 and Si . This variation can be explained by the nature that differs between the
coating/substrate interface and the other links that are generated. By comparing the Mo-V-N and MoN
films, we can then say: increasing the V content in the Mo-V-N film is more favorable for the production of
films with a low average value of the coefficient of friction. Which remains lower than that of MoN film
(0.65)? So this is regular with the mechanical properties.